Author Affiliations
Abstract
National Key Laboratory of Scattering and Radiation, Beijing 100854, China
Controlling the dispersion characteristic of metasurfaces (or metalenses) along a broad bandwidth is of great importance to develop high-performance broadband metadevices. Different from traditional lenses that rely on the material refractive index along the light trajectory, metasurfaces or metalenses provide a new regime of dispersion control via a sub-wavelength metastructure, which is known as negative chromatic dispersion. However, broadband metalenses design with high-performance focusing especially with a reduced device dimension is a significant challenge in society. Here, we design, fabricate, and demonstrate a broadband high-performance diffractive-type plasmonic metalens based on a circular split-ring resonator metasurface with a relative working bandwidth of 28.6%. The metalens thickness is only 0.09λ0 (λ0 is at the central wavelength), which is much thinner than previous broadband all-dielectric metalenses. The full-wave simulation results show that both high transmissive efficiency above 80% (the maximum is even above 90%) and high average focusing efficiency above 45% (the maximum is 56%) are achieved within the entire working bandwidth of 9–12 GHz. Moreover, an average high numerical aperture of 0.7 (NA=0.7) of high-efficiency microwave metalens is obtained in the simulations. The broadband high-performance metalens is also fabricated and experimental measurements verify its much higher average focusing efficiency of 55% (the maximum is above 65% within the broad bandwidth) and a moderate high NA of 0.6. The proposed plasmonic metalens can facilitate the development of wavelength-dependent broadband diffractive devices and is also meaningful to further studies on arbitrary dispersion control in diffractive optics based on plasmonic metasurfaces.
Photonics Research
2024, 12(4): 813
作者单位
摘要
电磁散射重点实验室, 北京 100854
给出了ZnTe电光晶体折射率和吸收系数随太赫兹波频率而变化的计算曲线, 比较了太赫兹波在ZnTe中传播时的相速度和群速度。通过与太赫兹频率和晶体厚度相关的电光效率响应函数, 理论计算了ZnTe电光晶体对太赫兹脉冲的探测电光响应, 得到了晶体厚度与探测到的太赫兹频谱宽度的定性关系, 从计算结果中找到了ZnTe电光晶体在5.3 THz和6.2 THz等多个频点的探测盲点, 这些探测盲点来自于ZnTe电光晶体与相应频点太赫兹波的栅格共振吸收。结合自制的大口径太赫兹光导天线和1 kHz脉冲重复频率的太赫兹时域光谱实验系统, 通过差分探测技术, 从实验上得到了太赫兹波极化方向与〈110〉型ZnTe晶体晶轴方向的六个最佳匹配角度, 给出了太赫兹电场最大值随晶轴与太赫兹波极化方向之间夹角变化的曲线及经验公式, 这将有利于在实践中对该现象的深入理解和对探测灵敏度的有效提高。
太赫兹探测 ZnTe晶体 电光响应 terahertz detection ZnTe crystal electric-optic response 
红外与激光工程
2019, 48(12): 1219001
作者单位
摘要
电磁散射重点实验室, 北京 100854
为测量太赫兹时域光谱散射测量系统的静区场强分布, 以确定后续测量目标的尺寸, 将金属球在静区三维方向上移动测量回波, 分别采用不同软件处理实验数据并得到不同类型的数据拟合曲线, 由拟合曲线得到了静区的三维空间范围。通过不同类型的曲线拟合发现, 相对于入射波方向在静区横截面的两维方向上, 电场强度分布近似为高斯分布, 而在入射波方向上的场强分布在某一范围内存在波动现象。还对系统的线性度进行了测量, 结果显示了系统具有良好的线性度。
太赫兹时域光谱 静区 场强 拟合曲线 terahertz time-domain spectroscopy quiet zone electric field intensity fitting curve 
红外与激光工程
2016, 45(11): 1125003
孙金海 1,2,3,*S. Brussaard 4J. G. 3N. Lemos 5[ ... ]黄志洵 1
作者单位
摘要
1 国家电磁散射辐射重点实验室, 北京 100854
2 中国传媒大学信息工程学院, 北京 100024
3 Department of Physics, University of Strathclyde, Glasgow, G4 0NG, UK
4 Department of Applied Physics, Eindhoven University of Technology, 5600 MB, Netherlands
5 GoLP/Centro de Física de Plasmas, Instituto Superior Técnico, Lisboa, 1049-001, Portugal
利用太赫兹波的单啁啾脉冲电光探测技术, 通过调节实验装置中λ/4波片晶轴与探测激光线偏振方向成45°, 可以巧妙地得到太赫兹波的绝对电场强度。利用CCD阵列, 通过抽运探测的方法可以得到太赫兹脉冲的光斑尺寸, 进而在两步实验的基础上计算得到太赫兹脉冲的能量。提供了一种行之有效的测量太赫兹脉冲能量的实验方案。
太赫兹 绝对电场强度 太赫兹光斑 脉冲能量 抽运探测 
中国激光
2009, 36(8): 2104
Author Affiliations
Abstract
Department of Physics, Capital Normal University, Beijing 100037
Varietal purity is the most important quality parameter of maize seeds, which has direct and prominent influence on the output and quality of maize. For the first time, to our knowledge, we present a new kind of terahertz (THz) scanning imaging technology for identification of maize seeds. Terahertz images of DNA samples are obtained by point-by-point scanning imaging technology. Inspection and identification of specific kinds of seeds are realized successfully by using the method of component pattern analysis. In this method, what we need are only data of image and absorption spectral information of samples; no specific features of samples are required. This technology provides a new approach for the detection and identification in biology and it can also be extended to poison inspection.
100.1160 Analog optical image processing 100.2960 Image analysis 100.5010 Pattern recognition and feature extraction 110.0110 Imaging systems 110.2960 Image analysis 
Chinese Optics Letters
2005, 3(0s): 239

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